Slot: DC_RF
DC (Direct Current) and RF (Radio Frequency) refer to the types of electrical power used to energize the sputtering target, and the choice between them depends on the properties of the target material.
URI: hzb_metadata_schema:DC_RF
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| SputteringPrevac | Physical vapor deposition (PVD) technique used to deposit thin films onto a s... | no |
Properties
- Range: String
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | hzb_metadata_schema:DC_RF |
| native | hzb_metadata_schema:DC_RF |
LinkML Source
name: DC_RF
description: DC (Direct Current) and RF (Radio Frequency) refer to the types of electrical
power used to energize the sputtering target, and the choice between them depends
on the properties of the target material.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: DC_RF
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: string