Class: Sputtering

_Physical vapor deposition (PVD) technique used to deposit thin films onto a substrate. In sputtering, high-energy ions (usually from a plasma) bombard a target material, causing atoms from the target to be ejected. These ejected atoms then travel through a vacuum chamber and settle on a substrate, forming a thin film. _

URI: hzb_metadata_schema:Sputtering

classDiagram class Sputtering click Sputtering href "../Sputtering" SynthesisProcess <|-- Sputtering click SynthesisProcess href "../SynthesisProcess" Sputtering <|-- SputteringPrevac click SputteringPrevac href "../SputteringPrevac" Sputtering <|-- SputteringVonAdenne click SputteringVonAdenne href "../SputteringVonAdenne" Sputtering : id Sputtering : iri Sputtering : name

Inheritance

Entity
- NamedEntity
  - Process
    - SynthesisProcess
      - Sputtering
        
        SputteringPrevac
        
        SputteringVonAdenne

Slots

Name	Cardinality and Range	Description	Inheritance
name	0..1 String	A human-readable name for a thing	Entity, NamedEntity
id	1 Uriorcurie	A unique identifier for a thing	Entity
iri	0..1 String	Internationalized Resource Identifier	Entity

Identifier and Mapping Information

Schema Source

from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema

Mappings

Mapping Type	Mapped Value
self	hzb_metadata_schema:Sputtering
native	hzb_metadata_schema:Sputtering

LinkML Source

Direct

name: Sputtering
description: 'Physical vapor deposition (PVD) technique used to deposit thin films
  onto a substrate. In sputtering, high-energy ions (usually from a plasma) bombard
  a target material,  causing atoms from the target to be ejected. These ejected atoms
  then travel through a vacuum chamber and settle on a substrate, forming a thin film. '
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
is_a: SynthesisProcess

Induced

name: Sputtering
description: 'Physical vapor deposition (PVD) technique used to deposit thin films
  onto a substrate. In sputtering, high-energy ions (usually from a plasma) bombard
  a target material,  causing atoms from the target to be ejected. These ejected atoms
  then travel through a vacuum chamber and settle on a substrate, forming a thin film. '
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
is_a: SynthesisProcess
attributes:
  name:
    name: name
    description: A human-readable name for a thing
    from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
    rank: 1000
    slot_uri: schema:name
    alias: name
    owner: Sputtering
    domain_of:
    - Entity
    - NamedEntity
    range: string
  id:
    name: id
    description: A unique identifier for a thing
    from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
    rank: 1000
    slot_uri: schema:identifier
    identifier: true
    alias: id
    owner: Sputtering
    domain_of:
    - Entity
    range: uriorcurie
    required: true
  iri:
    name: iri
    description: Internationalized Resource Identifier
    from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
    rank: 1000
    alias: iri
    owner: Sputtering
    domain_of:
    - Entity
    range: string