Slot: base_pressure
Pressure inside the vacuum chamber before the introduction of the working gas (usually argon) for the sputtering process.
URI: hzb_metadata_schema:base_pressure
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| SputteringPrevac | Physical vapor deposition (PVD) technique used to deposit thin films onto a s... | no |
Properties
- Range: Float
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | hzb_metadata_schema:base_pressure |
| native | hzb_metadata_schema:base_pressure |
LinkML Source
name: base_pressure
description: Pressure inside the vacuum chamber before the introduction of the working
gas (usually argon) for the sputtering process.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: base_pressure
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: float