Slot: flow_rate
Rate at which gases (typically inert gases like argon or reactive gases like oxygen or nitrogen) are introduced into the sputtering chamber. It plays a crucial role in controlling the plasma formation and the quality of the deposited thin film.
URI: hzb_metadata_schema:flow_rate
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| SputteringPrevac | Physical vapor deposition (PVD) technique used to deposit thin films onto a s... | no |
Properties
- Range: Float
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | hzb_metadata_schema:flow_rate |
| native | hzb_metadata_schema:flow_rate |
LinkML Source
name: flow_rate
description: Rate at which gases (typically inert gases like argon or reactive gases
like oxygen or nitrogen) are introduced into the sputtering chamber. It plays a
crucial role in controlling the plasma formation and the quality of the deposited
thin film.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: flow_rate
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: float