Slot: orientation
Refers to the spatial alignment and positioning of the target within the sputtering chamber. The target is typically positioned at an angle relative to the substrate. This angle can affect the trajectory of the sputtered atoms and the uniformity of deposition on the substrate.
URI: hzb_metadata_schema:orientation
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| SputteringPrevac | Physical vapor deposition (PVD) technique used to deposit thin films onto a s... | no |
Properties
- Range: String
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | hzb_metadata_schema:orientation |
| native | hzb_metadata_schema:orientation |
LinkML Source
name: orientation
description: Refers to the spatial alignment and positioning of the target within
the sputtering chamber. The target is typically positioned at an angle relative
to the substrate. This angle can affect the trajectory of the sputtered atoms and
the uniformity of deposition on the substrate.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: orientation
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: string