Slot: sputter_pressure
Pressure of the gas (typically argon) inside the vacuum chamber during the sputtering process. This pressure is usually measured in millibars (mbar), and it plays a critical role in determining the behavior of the plasma, the ion bombardment, and the deposition quality.
URI: hzb_metadata_schema:sputter_pressure
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| SputteringPrevac | Physical vapor deposition (PVD) technique used to deposit thin films onto a s... | no |
Properties
- Range: Float
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | hzb_metadata_schema:sputter_pressure |
| native | hzb_metadata_schema:sputter_pressure |
LinkML Source
name: sputter_pressure
description: Pressure of the gas (typically argon) inside the vacuum chamber during
the sputtering process. This pressure is usually measured in millibars (mbar), and
it plays a critical role in determining the behavior of the plasma, the ion bombardment,
and the deposition quality.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: sputter_pressure
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: float