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Slot: step_number

Many consecutive processes or steps of sputtering can be performed to layer the materials. This parameter documents the number of step or id.

URI: hzb_metadata_schema:step_number

Applicable Classes

Name Description Modifies Slot
SputteringPrevac Physical vapor deposition (PVD) technique used to deposit thin films onto a s... no

Properties

Identifier and Mapping Information

Schema Source

  • from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema

Mappings

Mapping Type Mapped Value
self hzb_metadata_schema:step_number
native hzb_metadata_schema:step_number

LinkML Source

name: step_number
description: Many consecutive processes or steps of sputtering can be performed to
  layer the materials. This parameter documents the number of step or id.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: step_number
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: integer
required: false