Slot: substrate_temperature
Temperature of the substrate onto which the thin film is being deposited during the sputtering process. This parameter is crucial because it can significantly influence the properties of the deposited film, such as its microstructure, morphology, adhesion, and overall performance.
URI: hzb_metadata_schema:substrate_temperature
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| SputteringPrevac | Physical vapor deposition (PVD) technique used to deposit thin films onto a s... | no |
Properties
- Range: Float
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | hzb_metadata_schema:substrate_temperature |
| native | hzb_metadata_schema:substrate_temperature |
LinkML Source
name: substrate_temperature
description: Temperature of the substrate onto which the thin film is being deposited
during the sputtering process. This parameter is crucial because it can significantly
influence the properties of the deposited film, such as its microstructure, morphology,
adhesion, and overall performance.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: substrate_temperature
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: float