Slot: target_power
The amount of electrical power applied to the sputtering target to generate the plasma and eject atoms from the target surface.
URI: hzb_metadata_schema:target_power
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| SputteringPrevac | Physical vapor deposition (PVD) technique used to deposit thin films onto a s... | no |
Properties
- Range: Float
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | hzb_metadata_schema:target_power |
| native | hzb_metadata_schema:target_power |
LinkML Source
name: target_power
description: The amount of electrical power applied to the sputtering target to generate
the plasma and eject atoms from the target surface.
from_schema: https://w3id.org/https://github.com/HZB-CE-DataSchemas//hzb-catalysisLabs-schema
rank: 1000
alias: target_power
owner: Sputtering_prevac
domain_of:
- Sputtering_prevac
range: float